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Piezo-University
Parallel and Serial Kinematics / Metrology
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Direct and Indirect Metrology
Non-contact sensors are used to obtain the most accurate position values possible for position servo-control systems. Two-plate capacitive sensors installed directly on the moving platform and measuring on the axis of motion offer the best performance. Resolution and repeatability can attain 0.1 nanometer in such systems. Indirect metrology—measuring strain at some point in the drive train—cannot be used in systems with the highest accuracy requirements.

Parallel and Serial Kinematics
There are two basic ways to design multi-axis positioning systems: Serial kinematics and parallel kinematics. Serial kinematics are easier to design and build and can be operated with simpler controllers. They do, however, have a number of disadvantages compared to higher-performance and more elegant parallel kinematics systems. In a multi-axis serial kinematics system, each actuator is assigned to exactly one degree of freedom. If there are integrated position sensors, they are also each assigned to one drive and measure only the motion caused by that drive and in its direction of motion. All undesired motion (guiding error) in the other five degrees of freedom are not seen and hence cannot be corrected in the servo-loop, which leads to cumulative error.

In a parallel kinematics multi-axis system, all actuators act directly on the same moving platform.
Only in this way can the same resonant frequency and dynamic behavior be obtained for the X and Y axes. It is also easy to implement parallel metrology in parallel kinematics systems. A parallel metrology sensor sees all motion in its measurement direction, not just that of one actuator, so runout from all actuators can be compensated in real-time (active trajectory control). The results are significantly less deviation from the ideal trajectory, better repeatability and flatness, as shown in Fig. 51.

Examples:
P-734, P-561, p. see link ff. in the “Piezo Nanopositioners & Scanning Systems” section.

Drawings & Images:
 
Fig. 50 a. Working principle of a stacked XY piezo stage (serial kinematics). Advantages: Modular, simple design. Disadvantages compared with parallel kinematics: More inertia, higher center of gravity, moving cables (can cause friction and hysteresis). Integrated parallel metrology and active trajectory control (automatic off-axis error correction) are not possible.
Fig. 50 a. Working principle of a stacked XY piezo stage (serial kinematics). Advantages: Modular, simple design. Disadvantages compared with parallel kinematics: More inertia, higher center of gravity, moving cables (can cause friction and hysteresis). Integrated parallel metrology and active trajectory control (automatic off-axis error correction) are not possible.

Fig. 50 b. Working principle of a nested XY piezo stage (serial kinematics). Lower center of gravity and somewhat better dynamics compared with stacked system, but retains all the other disadvantages of a stacked system, including asymmetric dynamic behavior of X and Y axes.
Fig. 50 b. Working principle of a nested XY piezo stage (serial kinematics). Lower center of gravity and somewhat better dynamics compared with stacked system, but retains all the other disadvantages of a stacked system, including asymmetric dynamic behavior of X and Y axes.

Fig. 50 c. Working principle of a monolithic XY<font face=symbol>q</font><sub>Z</sub> parallel kinematics piezo stage. All actuators act directly on the central platform. Integrated parallel metrology keeps all motion in all controlled degrees of freedom inside the servo-loop. The position of the central, moving platform is measured directly with capacitive sensors, permitting all deviations from the prescribed trajectory to be corrected in real-time. This feature, called active trajectory control, is not possible with serial metrology.
Fig. 50 c. Working principle of a monolithic XYqZ parallel kinematics piezo stage. All actuators act directly on the central platform. Integrated parallel metrology keeps all motion in all controlled degrees of freedom inside the servo-loop. The position of the central, moving platform is measured directly with capacitive sensors, permitting all deviations from the prescribed trajectory to be corrected in real-time. This feature, called active trajectory control, is not possible with serial metrology.

Fig. 51. Flatness (Z-axis) of a 6-axis nanopositioning system with active trajectory control over a 100 x 100 µm scanning range. The moving portion of this parallel metrology positioner is equipped with ultra-precise parallel metrology capacitive sensors in all six degrees of freedom. The sensors are continually measuring the actual position against the stationary external reference.<br><br>A digital controller compares the six coordinates of the actual position with the respective target positions. In addition to controlling the scanning motion in the X and Y directions, the controller also ensures that any deviations that occur in the other four degrees of freedom are corrected in real-time.
Fig. 51. Flatness (Z-axis) of a 6-axis nanopositioning system with active trajectory control over a 100 x 100 µm scanning range. The moving portion of this parallel metrology positioner is equipped with ultra-precise parallel metrology capacitive sensors in all six degrees of freedom. The sensors are continually measuring the actual position against the stationary external reference.

A digital controller compares the six coordinates of the actual position with the respective target positions. In addition to controlling the scanning motion in the X and Y directions, the controller also ensures that any deviations that occur in the other four degrees of freedom are corrected in real-time.


Related Information:
 
P-517  ·  P-527 Multi-Axis Piezo Scanner
High-Dynamics Nanoscanner for Scanning Probe Microscopy
 
M-824 Compact 6-Axis-Positioning System
Precision Parallel-Kinematics Micropositioner with Controller, Vacuum Versions
 




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