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Positioning in High Vacuum (HV) and Ultrahigh Vacuum (UHV)

Positioning in High Vacuum (HV) & Ultrahigh Vacuum (UHV)

Positioning in High Vacuum (HV) & Ultrahigh Vacuum (UHV) Providing precision positioning equipment for a vacuum environment follows clearly defined conditions. First, contamination of the vacuum chamber [...] μm × 100 μm in X, Y and to 10 μm in Z. The integrated flexure guides are free of maintenance, friction, and wear, and do not require lubrication. They are 100 % vacuum compatible and work in a wide temperature [...] product series that are already suitable for high vacuum (HV) or ultrahigh vacuum (UHV). Furthermore, most PI products can be modified on request for use in a vacuum. The products provided by PI achieve atmospheric
Optics Hutch Instrumentation

Optics Hutch Instrumentation

Motion and Positioning Equipment for 10 -8 hPa The instrumentation inside the vacuum tank included requirements for four degrees-of-freedom lens alignment and long-stroke positioning of an aperture in the [...] stand, and a manually adjustable decoupled base inside the vacuum. The synchrotron beam passes through the aperture in the platform of an UHV-compatible SpaceFAB SpaceFAB advantage: A long stroke in X allows [...] X-Ray Optics Hutch Instrumentation Coordinated Multi-Axis Positioning with Long-Term Stability and High Precision Vacuum chamber design for limited space inside the optics hutch: A sliding door enables
PI-Vacuum-Chamber-PI-Hexapod

Vacuum Chamber

Positioning the Vacuum Chamber for X-ray Diffraction Experiments Here, the PI Hexapod carries a UHV chamber for crystallographic experiments in high-energy X-rays (Image: Beamline I811, MAXlab, Lund, Sweden [...] Hexapod is used to align the vacuum chamber with the sample in the beam. With its six degrees of freedom, it positions a chamber of 20 to 50 kg with a repeatability of below 1 μm in any orientation. Ask an [...] spectroscopy and surface science dedicated X-ray diffraction experiments. For surface, interface, thin film and general X-ray scattering experiments a multipurpose diffractometer is available. Mounted on
PI-4-Axis-Positioning

Long-Term Positioning

Long-Term Positioning High-Precision at 10 -7 hPa High expectations to meet: Stacked 4‑axis positioning of the grating in UHV to 10-7 hPa The ADvanced RESonant Spectroscopy (ADRESS) beamline at the Swiss [...] (SLS) is a high-performance soft-X-ray undulator beamline operating in the energy range from 300 eV to 1.6 keV. Its RIXS endstation, for Resonant Inelastic X-ray Scattering, is based on SAXES, a high resolution [...] position the grating in several degrees of freedom: pitch for changing angle, rolling, vertical positioning, and horizontal transverse movement to allow the use of a second, selectable grating. For this task
Ambient Conditions

Ambient Conditions

suitable for operation in very different, sometimes extreme ambient conditions. Information on their use at high temperatures of up to 200 °C and in cryogenic environments can be found in the section >> Te [...] on the design and construction of the piezo actuators. PICMA® actuators are excellently suited for use in ultrahigh vacuums, since they can be manufactured without polymer components and can be baked out [...] magnetisms in the range of a few nanotesla have been measured in these products. Gamma Radiation PICMA® actuators can also be operated in high-energy, short-wave radiation, which occurs, for example, in electron
PICMA® Technology

PICMA® Technology

Highly Reliable Multilayer Piezo Actuators Fig. 1: PICMA® actuators in various different designs All-ceramic insulation High reliability and superior lifetime Low operating voltage <150 V High dynamics [...] dynamics Response times in the range of a few µs High force generation Minimum power consumption When holding the position In the case of PICMA® piezo actuators, the actual piezo ceramic is protected by an a [...] even in the cryogenic temperature range. Optimal UHV compatibility The exclusive use of inorganic materials, e.g., for insulation and electrical contact, provide the optimum conditions for use in ultra-high
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